The 96% Alumina Ceramic Dielectric Plate is a precision ceramic component designed for semiconductor plasma equipment requiring stable dielectric performance, excellent flatness, and reliable dimensional accuracy. Manufactured from high-purity 96% alumina ceramic, this circular substrate provides excellent electrical insulation, mechanical strength, and resistance to plasma environments. It is widely used as a dielectric discharge plate in semiconductor processing equipment where consistent electrical performance and structural stability are essential.
Product Properties
Downloads & Resources
| Resource Type | Link |
|---|---|
| Safety Data Sheet (SDS) | 96% Alumina MSDS-Innovacera |
| Technical Data Sheet (TDS) | 96% Alumina Ceramic Material Properties-SU0627 |
Product Details
The 96% Alumina Ceramic Dielectric Plate is a precision ceramic component designed for semiconductor plasma equipment requiring stable dielectric performance, excellent flatness, and reliable dimensional accuracy.
Manufactured from high-purity 96% alumina ceramic, this circular substrate provides excellent electrical insulation, mechanical strength, and resistance to plasma environments. It is widely used as a dielectric discharge plate in semiconductor processing equipment where consistent electrical performance and structural stability are essential.
With a diameter of 149.9 mm and a thickness of 0.635 mm, this ceramic plate features a surface roughness (Ra) of 0.3 μm and a warpage of 0.15%, ensuring excellent flatness for precision equipment assembly and stable plasma discharge performance.
Custom diameters, thicknesses, surface finishes, and machining specifications are available according to semiconductor equipment requirements.
Key Features
- 96% high-purity alumina ceramic
- Designed for semiconductor plasma equipment
- Excellent dielectric insulation performance
- High-dimensional accuracy
- Low warpage (0.15%)
- Fine surface finish (Ra 0.3 μm)
- Good plasma resistance
- Custom machining available
Applications
- Semiconductor plasma equipment
- Plasma discharge dielectric plates
- Plasma etching systems
- Plasma cleaning equipment
- Semiconductor manufacturing
- Vacuum processing equipment
Drawing
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Frequently Asked Questions
A 96% alumina ceramic dielectric plate is used as an insulating and plasma-resistant component in semiconductor plasma equipment, where stable dielectric performance and dimensional accuracy are required.
Alumina ceramic provides excellent electrical insulation, good plasma resistance, high-temperature stability, and reliable mechanical strength, making it suitable for demanding semiconductor processing environments.
The ceramic dielectric plate acts as an electrical insulating medium that helps maintain stable plasma discharge conditions and supports reliable operation of semiconductor processing equipment.
Low warpage improves assembly accuracy, ensures better contact with related components, and helps maintain stable performance in precision semiconductor equipment.
Controlled surface roughness helps achieve consistent surface performance, improves component integration, and meets the precision requirements of semiconductor manufacturing equipment.
Yes. Custom diameters, thicknesses, flatness requirements, surface roughness values, and other machining specifications can be produced according to semiconductor equipment requirements.
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